Advances in Chemical Vapor Deposition
Object category:
Elektronische Ressource
Person/Institution:
Publisher:
MDPI - Multidisciplinary Digital Publishing Institute
Place of publication:
Basel, Switzerland
Date:
2021
Extent, illustration, format:
1 Online-Ressource (94 p.)
Language:
Englisch
Providing institution:
Additional information
Abstract:
Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices
Object text:
English
Access and usage options
Contact
Universität Erfurt
Forschungsbibliothek Gotha
Schloss Friedenstein
Schlossplatz 1
99867 Gotha
+49 361 737-5540
bibliothek.gotha(at)uni-erfurt.de
Forschungsbibliothek Gotha
Schloss Friedenstein
Schlossplatz 1
99867 Gotha
+49 361 737-5540
bibliothek.gotha(at)uni-erfurt.de
Administrative details
Created:
2023-04-13
Last changed:
2021-11-25
Added to portal:
2023-04-13
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